인천대학교 인디고클랫폼 인천대학교 기술지원허브

가열된 필라멘트로부터 생성된 중성 라디칼을 이용한 금속 산화물 박막의 원자층 식각 방법 및 이에 의해 식각된 금속 산화물 박막

The proposed technology enables self-limiting and plasma-free Al₂O₃ removal with angstrom-scale thickness control. It can minimize ion bombardment, charging, photon damage, and surface defects associated with plasma-assisted etching. The process also improves surface smoothness, supports uniform treatment of complex three-dimensional structures, and may reduce equipment complexity and energy consumption by generating reactive neutral radicals using a heated tungsten filament.